We have investigated the thin film morphologies of novel PAG-containing patternable block copolymers (PPAG-b-PMMA). PPAG-b-PMMA block copolymers could be easily self-assembled by solvent annealing in thin-films. The morphology depends on the solvent system used for annealing, the relative molecular weights of the blocks and the annealing time. The well-defined nanoscopic PAG containing domains can be utilized for lithographic applications as well as nanocontainers for performing acid catalyzed reactions.

Self-assembly of photoacid generator-containing patternable block copolymer

239th National Meeting (2010)

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