The stability of a gas phase furfural hydrogenation catalyst (CuCr2O4�CuO) was enhanced by depositing a thin Al2O3 layer using atomic layer deposition (ALD). Based on temperature-programed reduction (TPR) measurements, the reduction temperature of Cu was raised significantly, and the activation energy for furfural reduction was decreased following the ALD treatment. Thinner ALD layers yielded higher furfural hydrogenation activities. X-ray absorption fine structure (XAFS) spectroscopy studies indicated that Cu1+/ Cu0are the active species for furfural reduction.

Enhancing the stability of copper chromite catalysts for the selective hydrogenation of furfural using ALD overcoating

248th National Meeting (2014)

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