Monoethanolamine (MEA), a commonly used solvent in wafer stripping, is one of the major components in Thin-Film Transistor Liquid Crystal Display (TFT-LCD) manufacturing wastewater in Taiwan. In this study, a novel aeration reactor which was 7 cm in diameter and 40 cm in height was used to mineralize MEA in the batch reaction. The experimental results revealed that the pH (3.0-9.0) did not play a vital role in eventual MEA mineralization efficiency with air purging in 1 sL/min. 30 mM H2O2 irradiated by 254 nm UV could remove more than 85% of total organic carbon (TOCr) from MEA solution (240 ppm TOC) in 3 h, while the UV/air process alone could attain 10% TOCr. The air introduced during the UV/H2O2 oxidation has been proved to improve the mineralization efficiency of MEA. Other parameters including incident radiation flux, air purging rate and oxidant concentration were also evaluated.

Application of air-assisted UV/H<sub>2</sub>O<sub>2</sub> advanced oxidation process for mineralization of Monoethanolamine (MEA)

248th National Meeting (2014)

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Application of air-assisted UV/H2O2 advanced oxidation process for mineralization of Monoethanolamine (MEA)

Application of air-assisted UV/H₂O₂ advanced oxidation process for mineralization of Monoethanolamine (MEA)