Photoacid generators are the compounds that can generate acids upon irradiation with light and are very significant compound because of the wide application areas in industries.   Although many types of photoacid generators have been developed, most of them are sensitive to the relatively shorter wavelengths of light ( < 300 nm).   The photoacid generators sensitive to i-line (365 nm) and g-line (436 nm) from a high-pressure mercury lamp are significant in relation to the industrial applications such as UV curing, photoresist, and so on.   In this study, novel photoacid generators that are thermally stable and highly sensitive to i- and g-lines were designed and synthesized based on imino sulfonate and N-hydroxyimide sulfonate structures.  Photochemistry of the photoacid generators prepared was studied and the photoacid generators were utilized for the preparation of screen printing plate with 6 microns L/S feature size.

Photoacid generators sensitive to i- and g-lines: Synthesis and applications for photopolymers

248th National Meeting (2014)

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.