Since 2005, ionic liquid (IL) bulk properties, and the IL/vacuum and IL/solid interfaces were thoroughly investigated in our group, primarily using angle-resolved X-ray photoelectron spectroscopy (ARXPS) under ultrahigh vacuum (UHV) conditions. For our studies we take advantage of the extremely low vapor pressure of aprotic ILs. In the course of IL-solid interface investigations, we have explored/developed new in-situ methods preparing ultrathin IL films on well-defined supports. Using these model systems, we address the fundamental question �How does the chemistry of solid support and IL with their specific interactions alter molecular arrangement and growth behavior at the IL/solid interface in the case of ultrathin IL layers?�An overview will be presented for recent results on our ARXPS interface studies, focusing on ultrathin IL films prepared by in-situ physical vapor deposition (PVD) including a system where film deposition is accompanied by partial thermal decomposition of the IL. In addition, a new method for preparing ultrathin ionic liquid (IL) films on surfaces by means of electrospray ionization deposition (ESID) will be introduced.1 In contrast to PVD of ILs under UHV, ESID even allows the deposition of ILs, which are prone to thermal decomposition. [C8C1Im]Cl on Au(111) was studied as first example of an IL that cannot be prepared as ultrathin film otherwise.1F. Rietzler, M. Piermaier, A. Deyko, H.-P. Steinr�ck, F. Maier, 2014, Langmuir 2014 , 30, 1063

Ultrathin ionic liquid layers - a close look at the interface

248th National Meeting (2014)

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