Block copolymer (BCP) thin films are being investigated for applications in next-generation lithography because BCPs can self-assemble into periodic domains of various morphologies (e.g., cylinders and lamellae) on length scales that surpass the resolution limit of optical lithography. A perpendicular orientation of domains relative to the substrate is necessary to facilitate subsequent pattern transfer; unfortunately, preferential interactions of any block with either the substrate or top interface drive orientation of the BCP domains parallel to the substrate. Non-preferential, �neutral� bottom and top interfaces, which can be provided by a surface treatment and a top coat, are necessary to achieve a perpendicular orientation of BCP domains. It would be advantageous to selectively isolate arbitrary areas of parallel and perpendicular BCP domains on the same substrate. Thus, a series of photopatternable surface treatments and top coats have been synthesized that contain a photoacid labile group. The surface treatment and top coat composition can be controlled via synthesis to achieve a neutral or preferential interface. Upon exposure to light, photoacid can cause the interface to change from 1) neutral to preferential or 2) preferential to neutral depending on the composition of the surface treatment or top coat. This allows for isolation of perpendicular BCP domains in either the exposed or unexposed regions of the substrate.

Photopatternable interfaces control the orientation of block copolymer domains

248th National Meeting (2014)

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