In many areas of science and technology, patterned films and surfaces play a key role in the engineering and development of advanced materials. However, cellulose based films have not been widely used for such purposes due to the lack of efficient and non-destructive patterning methods.<br/>In this contribution, non-destructive photolithographic patterning strategies of cellulose films for the realization of 2- and 3-dimensional micropatterns are presented. The main idea is to employ photo-acid induced reactions that convert an acid labile cellulose derivative to pure cellulose upon exposure to UV light by the aid of photoacid generators. When a mask aligner is used, areas exposed to UV light are converted to cellulose whereas protected areas remain unaffected leading to possible feature sizes in the single-digit micron range. Depending on the applied development procedure (either rinsing or enzymatic treatment) negative or positive-type patterns are obtained. Moreover, the use of 2-photon absorption lithography allows for realizing 3-dimensional structures having feature sizes of ca 0.5 microns by using the same strategy.

Photoregenerated cellulose: From 2D patterns to 3D microfabrication

249th National Meeting (2015)

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