Photolithography is an important manufacturing process that relies on using photoresists, typically polymer formulations, that change solubility when illuminated with ultraviolet (UV) light. Here, we demonstrate a general technique we call DOLFIN, which combines multiple benefits of traditional photolithography and is tailored toward efficient patterning of inorganic nanomaterials and sol-gel chemicals without diluting or contaminating them with organic photoresists and other byproducts. By purposely designing surface ligands outside NCs with photochemically active X<sup>− </sup>or Cat<sup>+</sup> groups, DOLFIN technique enables us to direct optical patterning of all-inorganic NCs, including metals, semiconductors, oxides, magnetic or rare earth compositions. Since DOLFIN is a photoresist-free method, no organic impurities are present in the patterned layers, which helps achieve good electronic and optical properties. The ability to directly optical pattern all-inorganic layers with resolution and light exposure dose comparable to that of organic photoresists provides an important opportunity toward a broad technological adaptation of solution-processed metals, dielectrics, and semiconductors.

Direct optical lithography of functional inorganic nanomaterials

255th National Meeting (2018)

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