Using organosilanes to create nanopatterns on substrates offers a versatile and cost effective means of preparing single monolayer or multilayer patterns for potential use in biological and industrial systems. As such, the study of organosilane lithography has attracted recent attention. Nanoscale surface patterns were prepared using facile methods of surface modification techniques. In this set of experiments, particle lithography in conjunction with two different deposition techniques were used in order to prepare spatially selective patterns of organosilanes. Nanoscale surface modification was fabricated on polished Si(111) wafers. A surface layer of latex or silica mesospheres was used to create a pattern of rings or pores on the substrates being used. In order to make aminopropyltriethoxysilane (APTES) and octadecyltrichlorosilane (OTS) molecules bind to the unmasked portions of the substrate, either chemical vapor deposition (CVD) or immersion protocols were performed. By adjusting the infinitesimal amount of water, surface morphology of the nanostructures can be tailored to create nanopores or nanorings. The use of CVD with APTES resulted in ring-shaped nanosturctures, while the use of immersion protocols with OTS resulted in nanopores being created. Samples were analyzed by scanning probe microscopy, using an atomic force microscope (AFM). Surface coverage, size, and depth were determined from the produced nanopatterns; the experimental data is supported by high-level and contemporary semi-empirical computational calculations. Our studies offer a versatile means of building complex architectures that are potentially applicable in a range of electronic and biological processes.

Characterization of organosilane nanostructures with atomic force microscopy

2019 Spring National Meeting

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.