Recent studies demonstrate that the IrO2(110) surface is highly active in promoting methane dissociation, with C-H bond cleavage occurring at temperatures as low as 100 K in ultrahigh vacuum. In this talk, I will discuss recent AP-XPS investigations of CH4 oxidation on IrO2(110) that we performed at methane partial pressures up to 1 Torr. We find that methane efficiently reduces an IrO2(110) film on Ir(100) at temperatures above 500 K, with the rate of reduction depending on both temperature and CH4 partial pressure. Complete reduction of the oxide film demonstrates that lattice oxygen migrates rapidly to the surface to sustain methane oxidation under the conditions studied. I will also discuss results obtained during steady-state CH4 oxidation over IrO2(110) and the nature of surface species observed with XPS during reaction.

Methane oxidation on an IrO2(110) film

2019 Fall National Meeting

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