The production of electronic, photonic and metamaterial-based devices requires controlled deposition or structuring of functional materials. Electron-beam lithography (EBL) allows unparalleled miniaturization of those devices due to its high resolution. A tetrafunctional cinnamate is synthesized and EBL is performed as a proof-of-concept negative resist without the need for chemical amplification; structures with resolutions below 100 nm are easily achieved. Usually, EBL is accompanied by structure damage and material degradation as non-defined radicals are created. However, the combination of UV cross-linkable groups with low electron-beam intensities offers the advantages of selective crosslinking with high resolution. Electron impact promotes a cinnamic ester group to its excited state, which subsequently dimerizes according to the Woodward Hoffmann [2+2] cycloaddition formalism. Excitation of molecules by electron impact has been long known in the fields of mass spectrometry and electron impact fluorimetry and transferred to the condensed phase, which can thus serve as a technique to achieve facile structures. EBL crosslinking of cinnamic acid-functionalized materials should allow patterning of advanced functional organic materials.

Electron-beam allowing simple nanostructuring of cinnamate-based materials

Macromolecular Chemistry: The Second Century

[Author Benefits](https://scimeetings.acs.org/?utm_source=pubs_content_marketing&utm_medium=website&utm_campaign=0320_MCF_NPI_Launch_Spring_Homepage&ref=pubs_content_marketing)

[How to use SciMeetings](https://storage.googleapis.com/dl.morressier.com/acs/SciMeetings-ACSSpring2020-HowToGuide_M3020-Final.pdf)

[Frequently Asked Questions](https://storage.googleapis.com/dl.morressier.com/acs/SciMtng_ACSNMSp2020_FAQ_M3120_Final.pdf)

ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.