MXenes are a unique class of 2D layered materials with general formula Mn+1XnTx (n=1–3) with proposed application as supercapacitors, Li-ion batteries electrode, and as a field effect transistor. These structures are derived from a parent MAX phase where the A layer (an element from groups 13–16) is removed by washing with an appropriate etching solution (most commonly used etching solution is 30% HF). MXene phases are comprised of an early transition metal M; X is carbon and/or nitrogen; and Tx stands for the surface termination (-F, -O, and/or -OH; attached by the etching process of the parent MAX phase). The electronic structure and crystallinity of the canonical MXene Ti3C2Tx is strongly correlated to the nature of the surface composition and the number of layers which in turn depend on the etching and exfoliation processes. Herein, we demonstrate that the use of chelating agents in tandem with low concentrations of HF serves as an effective method to selectively etch aluminum whilst retaining high crystallinity of the sample. Additionally, the low concentrations of HF allow for the increased concentration of Ti-O and Ti-OH terminal groups. Since the Ti-O and Ti-OH termination on the basal plane surfaces resembles that of early transition metal oxides that bind strongly to late transition metal ions, crystalline Ti3C2Tx serves as excellent support for the nucleation and growth of late transition-metal oxides nanoparticles. The strong interaction of these nanoparticles with the support reduce the coarsening of active nanoparticles impacting the catalytic activiy and stability.

Chelating agents in tandem with minimal concentrations of HF as an alternative method to highly crystalline MXene Ti3C2Tx nanostructures

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

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