Chemical mechanical planarization (CMP) is a process used to achieve angstrom-level uniformity of semiconductor devices which has played a critical role in the extension of Moore’s Law. The CMP process utilizes a nanoparticle dispersion (known as a slurry) that contains abrasives, rate enhancing additives, and critical metal passivation chemistry, coupled with a mechanical force to remove excess topography. Traditional abrasives used in Cu CMP such as silica (SiO2) can aid in the mass transport process but can aggregate or adsorb to the surface which can cause defects such as scratching, and low material removal rate (MRR) selectivity can lead to dishing and erosion. Specifically, through silicon vias (TSV) are necessary to produce 3D integrated circuit devices; however, due to the large Cu overburden, TSV requires high MRR, low dishing, high selectivity, low defectivity, and uniform surface topography. This work focuses on developing multi-functional reactive nanocomposite abrasive particles to transport chemistry to the surface to enhance overall CMP performance. These pressure-responsive particles are synthesized by functionalizing SiO2 with strong Cu chelators as the inner layer which becomes exposed after reaching a pressure threshold and removing the outermost layer consisting of a weak Cu chelator. The SiO2 core is initially functionalized by covalently bonding aminosilanes, which then non-covalently interact with additives containing Cu complexing functional groups. Results indicate that these nanocomposites must strike a synergistic balance between chemical activity and the ability to form passivation films at the Cu interface is critical to controlling MRR. Utilizing potentiodynamic scans it was determined that the activation energy of film formation shows a direct correlation to controlled MRR and reduced defectivity.

Synthesis and characterization of functionalized nanocomposite abrasive particles for chemical mechanical planarization (CMP) applications

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.