The ability to efficiently couple pattern-specific monolayers with dopants that demonstrate great structural variability is desired in the manufacturing of novel logic switching elements. In this study, we demonstrate a reliable protocol for the delivery of a phosphorus-based dopant onto functionalized silicon with spatial control at the microscale. This method relies on selective surface reactions of immobilized carbene species with phosphine derivatives. This bilayered system provides terminal functionalities that can be photochemically modified via UV-assisted contact printing between the functionalized surface and an elastomeric stamp inked with the molecular dopant. Spectroscopic measurements combined with electron microscopy was used to characterize the dopant attachment and patterning ability of this technique. Several notable features are observed in the resulting spectra that are indicative of the bonding behavior between dopant and carbene monolayer including an increase in the atomic percentage of phosphorus atoms on the surface observed after photochemical printing. Microscopic analysis of the corresponding surface structures demonstrates high fidelity pattern transfer. Our approach to atomic precision surface processing has the potential to inform future development of next-generation devices in applications such as; quantum electronics, surface passivation, optics, biomedical devices, and sensors.

Functionalization of silicon with photo-sensitive carbene precursors for patterning monomolecular phosphorus-based dopant species

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.