Although supercritical fluids are well-known in polymer synthesis and processing, we demonstrate a novel means of depositing polymer films from supercritical fluids without using in-situ chemical reactions. Material deposition can be directed to form structures with a higher resolution than any conventional printing technique. In addition, our technique does not require a deposition mask or multiple stamps, registry between layers can be accomplished with high degree of accuracy. The process relies on the existence of a local maximum in polymer solubility as a function of temperature when the solvent is pressurized above its critical pressure and heated towards its critical temperature. By holding the temperature of the solution near this maximum and resistively heating a substrate introduced into the vessel, polymers precipitate from solution and form a thin film. Further, by lithographically patterning the substrate, we control the pattern of resistive heating components and in turn, control the placement of the deposited films. By using our lithographically patterned substrates as a deposition master, we have created a manufacturing technique for high-resolution flexible and stretchable electronics. The technique can also deposit materials on surfaces of virtually any curvature. The technique combines lithographic patterning with solution phase self-assembly in a manner never before achieved, opening the door for the control of materials at all length scales.

Physical supercritical fluid deposition: Top-down meets bottom-up self assembly

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.