Interaction of boron-containing compounds, including boron trichloride and 4-fluorophenyl boronic acid, and nitrogen-based compounds, hydrazine, with Cl-terminated Si(100) surface were studied in order to understand the interaction of these molecules with the surface for designing possible silicon doping processes. The reactions reported utilized Cl-terminated Si(100) surface prepared by wet chemistry methods and selected comparisons were made with the H-terminated Si(100). The process was followed by X-ray photoelectron spectroscopy (XPS). Within the reaction conditions investigated, boron trichloride does not react with the H-terminated surface, but it does react with the Cl-terminated surface where a peak for B 1s around 193 eV corresponding to (B-O)x species was recorded. A reaction of hydrazine with Cl-terminated Si(100) and Hydrogen-terminated Si (100) in a liquid phase was performed in order to compare the reactivity of these surfaces and infer differences with previously investigated reactions of this compound with Si(111) crystal face. Finally, a reaction of 4-Fluorophenyl Boronic acid was studied on both H- and Cl-terminated Si(100) surfaces. This compound reacts preferentially with the Cl-terminated Si(100), as confirmed by observation of a B 1s peak at 191.2 eV and F 1s peak at 689.3 eV. Density functional theory was utilized to supplement the analysis and identify major surface species resulting from these reactions. This work provides a new pathway to obtain a defined functionalized silicon surface with different boron and nitrogen compounds that can be used for further functionalization or as a mean of selective doping.

Reactions of boron- and nitrogen-containing compounds with Cl-terminated Si(100) surface

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

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