In order to meet the demands for scaling of future semiconductor devices, we explore using colloidal lithography and implement conventional fabrication processing tools for patterning substrates at and below the 5 nm scale. Our processing pathway combines ‘bottom-up’ methods using inorganic nanocrystal (NC) synthesis and self-assembly techniques with ‘top-down’ nanofabrication techniques such as dry etching. A pattern is established by the size, shape, and arrangement of discrete NC building-blocks, and the density is determined by the interparticle spacing of each constituent element. The collective arrangement of each element sets the overall pattern, where each NC serves as a discrete hard etch mask. We implement self-assembly at a liquid-air interface and topographic template-assisted capillary assembly methods to establish the NC patterns. This pattern is transferred to the underlying substrate using inductively couple plasma (ICP) reactive ion etching (RIE), and a selective chemical wet etch is used to remove any remaining mask material after pattern transfer. The NC systems explored are Fe3O4 spheres, TiO2 nanorods, and GdF3 rhombic plates. The Fe3O4 and GdF3 material systems offer reasonable etch resistance for CF4 and Cl2 plasma etch chemistries. Deposition of a thin Cr film in the interstitial spaces of monolayer assemblies and selective NC removal also enables negative-tone pattern transfer. A major goal of our pathway is to implement innovative processing methods into already well-established fabrication methods and technology, while maintaining process simplification and enabling wider access to patterning at the deep nanoscale. The techniques developed by this research may impact several sectors by enabling single digit nanofabrication on a substrate for use in integrated circuits, memory devices, optoelectronics, plasmonics, and chemical/biological sensing applications.

Sub-5 nm patterning via self-assembly and template-assisted assembly of colloidal nanocrystals

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

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