Extreme ultraviolet (EUV) lithography, using 13.5 nm radiation, is a prominent candidate for next generation nanomanufacturing. Here, we discuss our latest steps forward with zinc oxide-based metal organic cluster photoresists, possessing small nanoparticle size, good solubility in spin-coating solvents, good film-forming abilities and patterning enhanced by incorporating a photo-acid generator or photo-radical generator. Using the chemistry of metal-organic framework compounds, we have identified synthetic strategies that enable production of compositionally and size identical metal organic clusters. A main challenge for EUV resists is to simultaneously satisfy resolution, LWR (line-width roughness) and sensitivity requirements to meet the goals of the ITRS roadmap. We are approaching this by changing the metal oxide core, ligands, photoactive compounds and exposure process. The lithographic performance of this and other metal oxides will be described and etch characteristics of these materials will be discussed.

Metal organic clusters as building blocks for nanofabrication systems

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.