Block copolymer (BCP) self-assembly is showing great promise for extending the resolution limits of established, high-throughput photolithography techniques. This technology has the potential to broadly enhance device capabilities ranging from magnetic data storage media to photovoltaic cells to semiconductors. We have developed BCPs which incorporate silicon into one of the block components that can be easily adapted into a number of emerging processes. Appropriately incorporating silicon functionality facilitates BCPs with high Flory-Huggins interaction parameters (χ) and dry etch-selectivity during reactive ion etching enabling sub-5 nm half-pitch pattern development. This talk will highlight the development of these BCPs along with new processing protocols for controlling their domain alignment and give a perspective for their future implementation into commercial lithographic patterning processes.

Resolution in a bottle: Self assembly meets lithography

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.