Semiconductor surface science serves as the foundation for applications ranging from microelectronics to optoelectronics to bio-sensing. Given the importance of semiconductor materials in important technologies of today, being able to control their surface properties is key to future advances. One way to modify the surface properties of a semiconductor is by functionalizing it with organic monolayers, multilayers, and thin films. This talk will describe studies on the formation of organic layers at semiconductor surfaces, aimed at the ultimate goal of controlling subsequent fabrication processes. The presentation will examine two contrasting systems of functionalization.  In one case, formation of well-ordered alkanethiolate multilayers occurs on a copper oxide surface by self-assembly after exposure of the surface to vapor alkanethiols. In the other example, intentional attachment via carbon-carbon bond formation of covalently-bound organic multilayers is achieved on silicon through the process of photo-initiated molecular layer deposition (MLD). A combination of microscopy, spectroscopy, and x-ray scattering studies provides insight into both the functionalization mechanisms and the structure of the resulting organic films.  The application of both types of layers to serve as resists for area selective deposition will also be described.

Semiconductor surface functionalization: From self-assembly to photoinitiated film growth

Macromolecular Chemistry: The Second Century

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ACS Spring 2020 National Meeting & Expo

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.