Atomic layer deposition is a novel growth technique for the fabrication of novel catalytic materials.  Vanadyl triisopropoxide (VOTP) is one of the possible precursors used in growing vanadia catalytic species on oxide supports.  The work presented here examines the interaction of this particular precursor with SrTiO3 (001) single crystals by using x-ray photoelectron spectroscopy (XPS) which provides correlation of the reaction to the surface hydroxyl coverage.

Interaction of vanadyl triisopropoxide with SrTiO3 (001)

239th National Meeting (2010)

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