Nanoporous thin films derived from the self-assembly of block copolymers has received much attention because of their potential applications as nanolithographic masks, separation membranes, nanoreactors, and sensors.  Block copolymers that give rise to a cylindrical morphology perpendicular to the substrate are of particular interest.  Thin films derived from such BCPs provide a channel from the free surface to the substrate, while selective removal of the minor component comprising the cylindrical domain leads to nanoporous films.  This work describes the synthesis and thin film behavior of a polystyrene-block-poly(ethylene oxide) (PS-b-PEO) block copolymer with a new cleavable linker incorporated between the two components.  Solvent annealing of the thin films resulted in a highly ordered array of PEO cylinders in a PS matrix.  Upon cleaving of the blocks with acid, nanoporous films were obtained.

Highly ordered nanoporous thin films derived from polystyrene-<i>block-</i>poly(ethylene oxide) with a cleavable acetal linkage

241st National Meeting (2011)

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Highly ordered nanoporous thin films derived from polystyrene-block-poly(ethylene oxide) with a cleavable acetal linkage