Cylindrical and lamellar nanostructures of block copolymers in thin films can be perpendicularly oriented to the plane of the films by neutralizing surfaces of the substrates. These perpendicularly oriented nanostructures can be utilized as etching masks and guiding templates to generate directed patterns of functional materials. In this study, perpendicularly oriented cylindrical and lamellar nanostructures of diblock copolymers were fabricated on silicon oxide substrates which were neutralized by the self-assembled monolayer. By dissolving the silicon oxide with hydrofluoric acid, the fabricated films were transferred onto functional materials such as graphenes and ZnO layers. After one of the blocks of copolymers was selectively removed from the transferred films, the remaining copolymers were used as etching masks and guiding templates. Graphene nanostructures were fabricated by etching process with the copolymer etching mask. ZnO nanostructures were also synthesized by hydrothermal process guided by the copolymer template.

Graphene and ZnO nanostructures directed by block copolymer thin films

243rd National Meeting (2012)

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