Ionic self-assembled multilayer films can be fabricated with silica nanoparticles to exhibit excellent transparency, homogeneity, and very low reflectance (<0.01%).  The porosity caused by the nanoparticles leads to a void space of 36% to possess a refractive index near the ideal value. However, the interconnectivity of the constituents and to the substrate is based upon electrostatic ionic attraction, which results in unsatisfactory stability and scratch resistance.  By various methods for the addition of polyelectrolytes into the film's matrix, the stability can be substantially improved.  Through the encapsulation of the nanoparticles by a photo-curable oligomer known as diazo-resin a polycation solution was utilized to make films with polystyrene sulfonate. Under the presence of UV irradiation the films cross-linked successfully to render the films stable. Another explored method involves the interpenetration of high molecular weight polyelectrolytes poly(allylamine hydrochloride) and poly(acrylic acid) into the silica nanoparticle matrix.  Thermal and chemical crosslinking of these polyelectrolytes leads to dramatically improved scratch resistance.

Incorporation of crosslinking polyelectrolytes with silica nanoparticles into layer-by-layer (LbL) self-assembled anti-reflection films for improved scratch resistance and stability

243rd National Meeting (2012)

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