In this contribution, the synthesis and the solution behavior of a pseudo-schizophrenic diblock copolymer is presented. The block copolymer is composed of a photocleavable poly(p-methoxyphenacyl methacrylate) block (PMPMA) and a thermo-sensitive poly[oligo(ethylene glycol) methacrylate] block (POEGMA). Micelles with a photo-sensitive core are formed by the dissolution in water of the PMPMA-b-POEGMA copolymer. The formation of PMAA-b-POEGMA unimers is promoted by light irradiation. The corresponding inverse micelles are then formed by a thermal stimulus (Fig.1). Fig.1:  PMPMA-b-POEGAMA behavior in solution.

Synthesis and self-assembly in water of a light and thermo sensitive pseudo-schizophrenic diblock copolymer

243rd National Meeting (2012)

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.