This talk will cover two topics based on applications of polymers: sequential infiltration synthesis (SIS) and organic photovoltaics.  SIS is a new materials synthesis technique, derived from atomic layer deposition, with applications ranging from advanced lithography to separation membranes.  Coupled with block copolymer self-assembly, SIS provides a unique pathway to complex 2-D and 3-D nanostructures.  Self-assembly can also be utilized to begin deciphering structure-property relationships in OPVs.  A few examples of rationally designed assembly in OPV systems will be discussed, along with recent results that point to a rethinking of the idealized morphology in OPVs.Use of the Center for Nanoscale Materials was supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.

Polymer molecular engineering: Vignettes from lithography and photovoltaics

243rd National Meeting (2012)

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