Self-assembled nanostructures continue to be the focus of intense research due to their obvious inspiration from Nature, and secondly, their enormous utility for patterning nanoscale structures with little outside intervention. One of the key ingredients required for future applications of nanoscale self-assembly is the ability to integrate numerous one-dimensional addressable nanostructures via their synthesis, patterning, and alignment on technologically relevant solid interfaces.  Here we will outline our approaches towards the use of self-assembled block copolymer nanostructures on technologically relevant semiconductor materials, to produce highly ordered sub-50 nm features in minutes, such as the density-doubled platinum lines on silicon shown below. 

Complex nanopattern formation through block copolymer self-assembly

243rd National Meeting (2012)

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