Hydrogen-passivated Si(111) surfaces are produced through two different preparation methods: modified RCA and HF treatment. The two types of surfaces have been examined by infrared spectroscopy (IR) X-ray photoelectron spectroscopy (XPS) and charge-carrier lifetime measurements, and display different chemical and electrical properties. The HF treatment yields long charge-carrier lifetime and low surface recombination velocity, but atomically rough surface. The modified RCA method produced chemically well defined mono-hydride silicon surface with relatively poor electrical properties. The two types of surfaces produced were further subjected to modification with chlorine (PCl5) and alkene monolayers (C11 and C18).  The chemical and electrical properties, surface structure, and chemical reactivity of the surfaces have been investigated by X-ray photoelectron spectroscopy, IR, and atomic force microscopy. The procedures for surface preparations and modifications will be discussed.

Chemical and electrical passivation of silicon surfaces through hydrosilylation and chlorination reactions

243rd National Meeting (2012)

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