Block copolymer supramolecular assemblies (SMA) can be used to prepare nanotemplates as well as nanoarrays of a variety of functional materials. This has been achieved via selective H-bonds to one block of the block copolymer from a low molecular weight additive. Herein we propose to extend the range of additives by exploring non-covalent interactions other than H-bonds. This is illustrated with the following SMA: diblock copolymer poly(styrene-b-4-vinylpyridine) (PS-PVP) and the low molecular weight additive 3,4(2,2-dimethylpropylenedioxy)thiophene (ProDOT). The main advantage of this SMA is that ProDOT, the additive, is a precursor to an electroconductive polymer which has numerous applications throughout the field of organic electronics. In this work, we discuss vapor annealing of SMA thin films in order to control the orientation of the SMA domains relative to the substrate.

Supramolecular assemblies of block copolymers and conjugated polymer precursors

243rd National Meeting (2012)

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