While there has been dramatic progress in creating patternable systems that permit formation of sub-50 nm structures, there remain significant challenges in going well below that size.  Block copolymers offer a means to resolve this impasse, but like any other resist system they have distinct limitations. We have recently shown we can control the self-assembly process by solvent annealing, and by choice of solvent.  In addition to self-assembly, approaches using molecular glass and nanoparticle photoresists will also be described. The systems have the advantage of the ability to form arbitrarily shaped patterns in contrast to self-assembled materials and show prospects of sub-20 nm structure formation. New tools for thermal processing such as laser spike annealing enable thermal excursions above 500 �C in microsecond time regions and will be discussed

Challenge of nanotechnology: Making patterns on the size scale of macromolecules

243rd National Meeting (2012)

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