Ionic liquids are generating considerable current interest as media for electrochemical processes such as electrodeposition, which can be used to create thin films of a variety of compounds.  For the first time, silicon deposition has been achieved in the phosphonium ionic liquid triethyl(2-methoxyethyl)phosphonium bis(trifluoromethylsulfonyl)amide (P201-TFSI).    Subsequently, silicon has been deposited from a wide variety of precursors in order to optimize the thickness and morphology of the deposited films. The silicon films electrodeposited in the phosphonium ionic liquid show marked differences from those deposited in organic solvents, imidizolium and pyrrolidinium based ionic liquids.

Electrodeposition of silicon in a phosphonium ionic liquid

243rd National Meeting (2012)

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