In this work, we present a new method to functionalize Si(111) surfaces with �NH- termination through  wet chemistry at room temperature. Compared with previous Si-N based silicon surfaces preparation procedures, the greatest advantage of our work is that only mild reaction conditions are needed: no glove box or vacuum environment are required.  Starting with a commercially available Si(111) crystal, Cl-terminated silicon sample was prepared by previously developed wet chemistry methods. Then, this surface was treated with a NH3/THF solution at inert conditions to obtain the �NH- terminated Si(111) surface. In order to identify the surface products after each modification step, the surface was monitored by infrared spectroscopy, X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry. In addition, density functional theory calculations were employed to predict N 1s core-level energy and evaluate the possible reaction mechanisms.

Preparation of -NH-terminated-Si(111) surfaces through wet chemistry

244th National Meeting (2012)

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