The chemical vapor deposition of polymer films eliminates the need for organic solvents and thereby offers a safer and cleaner alternative to liquid-phase polymer processing. The initiated chemical vapor deposition (iCVD) is a vapor-phase free radical polymerization technique that can be used to produce films that exhibit a wide range of properties such as hydrophobicity, hydrophilicity, and responsiveness to heat, pH, and light. Unlike most vapor deposition techniques, the iCVD process is not a line-of-sight process and therefore it can be used to uniformly coat substrates that have complex three-dimensional shapes. This talk will discuss new iCVD methods that can be used to pattern three-dimensional porous materials with functional polymers.

Vapor phase deposition of polymer coatings onto porous materials

245th National Meeting (2013)

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