Benzotriazoles are widely used anticorrosive chemicals contained in dishwasher detergents as well as in industrial products such as de-icing and anti-icing fluids. They are very water-soluble and partly recalcitrant to abatement in municipal wastewater treatment plants, and are consequently present as contaminants in surface waters at relatively high concentrations. They have been recently shown to occur even in drinking water. Thus, there is a strong interest in exploring processes for their elimination from wastewaters and natural waters. In the present study we investigate the photochemical transformation (?=254 nm) and hydroxyl radical reactivity of three representatives of this compound class, namely 1H-benzotriazole and its 5-methyl and 5-chloro derivatives. All three compounds show a decreasing photoreactivity with increasing pH due to their acid-base speciation (7.7<pKa8�109 M-1s-1). Thus, the UV/H2O2 advanced oxidation process appears to be promising to reduce their load in the aquatic environment.

Benzotriazoles: Reactivity toward UV-C light and the hydroxyl radical, and removal by the UV/H<sub>2</sub>O<sub>2</sub> process

245th National Meeting (2013)

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Benzotriazoles: Reactivity toward UV-C light and the hydroxyl radical, and removal by the UV/H2O2 process

Benzotriazoles: Reactivity toward UV-C light and the hydroxyl radical, and removal by the UV/H₂O₂ process