Facile development of efficient platinized titanium dioxide (Pt-TiO2) thin films using versatile gas phase methods was demonstrated. The TiO2 films were deposited by an aerosol chemical vapor deposition (ACVD) method, which have unique 1D nanostructures with highly oriented crystal phase at (112) plane having high surface energy for catalytic reactions. Platinum (Pt) nanoparticles (NPs) were decorated by a unique target tilt sputtering (TTS) method, which allows to control the Pt size from 0.5 to 2 nm with narrow size distribution. The Pt-TiO2 thin films exhibited excellent CO2 photoreduction efficiency with selective CH4 formation, which is due to the synergistic effects of high surface area and minimized charge barriers by oriented single phase crystallinity of the films, and efficient electron-hole separation by the Pt NPs.

Facile development of platinized TiO<sub>2</sub> thin films by gas phase deposition methods for CO<sub>2</sub> photoreduction

245th National Meeting (2013)

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Facile development of platinized TiO2 thin films by gas phase deposition methods for CO2 photoreduction

Facile development of platinized TiO₂ thin films by gas phase deposition methods for CO₂ photoreduction