Patterns on several hundred nanometer to severalmicrometer scale were fabricated on dye-sensitized solar cells (DSSCs) using asoft-lithographic technique to incorporate a photonic crystal (PC) geometry and/ormodify the electron pathways in DSSCs. A photo-curable perfluoropolyether(PFPE) was used to replicate designed PC patterns in a silicon master. Suchembossed surface patterns having a PC geometry included one-dimensional linepatterns and two-dimensional arrays of cylindrical posts having a hexagonalgeometry on a several hundred nm scale. Rectangular ITO posts on a severalmicrometer scale were also patterned to modify the substrate structure in orderto reduce the electron pathway in the DSSCs. The optical characteristics,incident photon-to-current conversion efficiency (IPCE), andphotocurrent-photovoltage behavior of patterned DSSCs were measured to analyzethe effect of the PC surface structure and modified substructures on theoptical and physical nature of the DSSCs especially their power conversionefficiency.

Application of soft-lithographic patterning to dye-sensitized solar cells

245th National Meeting (2013)

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