To help enable high-throughput nanopatterning technologies, a strategy to replicate nanopatterns formed by the self-assembly of lamellae-forming block copolymer (BCP) was investigated. To accomplish this, liquid compositions (i.e. conformal layers) are placed between the surfaces of the �master� poly(styrene-block-methyl methacrylate) film and transparent �replica� substrate that solidify and covalently bind to the BCP upon exposure to light. The conformal materials able to replicate the BCP pattern were comprised of a multifunctional acrylic monomer, a benzophenone compound, and a visible wavelength photoinitiator. The replication is light activated, scalable to large areas, occurs below the glass transition of the BCP, and takes less than 1 h. Scanning electron micrographs of the replica samples show that specific patterns can be copied. Control experiments conducted with alternative liquid compositions indicate that interfacial photosensitization of the BCP by excited benzophenone is the primary mechanism by which pattern replication takes place.

Replicating thin film block copolymer patterns with light activated chemistries

245th National Meeting (2013)

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