Block copolymer thin film orientation control remains an important area of research for applications ranging from organooptoelectronics, nanoporous membranes, to advanced lithography. Etch-resistant silicon-containing block copolymers require control of the top interface, which is most often accomplished through the use of solvent annealing. Herein is described a fast thermal annealing process for obtaining perpendicular features of a silicon-containing block copolymer. The process utilizes a polarity-switching top coat polymer and requires only a spin-coater and hot plate.

Polarity-switching top coat polymers enable thin film block copolymer orientation control

245th National Meeting (2013)

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