Controlling the domain orientation of self-assembled block copolymer thin films is critical for applications in nanotemplate design, nanoporous membranes, and organic optoelectronics.  Two key aspects of our work focus on the substrate surface and free surface manipulations of thin film interfaces.  In one example, we utilized a gradient approach to examine the effect of substrate surface chemistry and film thickness on the domain orientation of cylinder-forming poly(styrene-b-isoprene-b-styrene) (SIS) thin films.  Parallel cylinders or hexagonally perforated lamellae (HPL) were generated as a function of the substrate surface chemistry on a surface gradient.  In another example, we explore a spatially-resolved approach for the solvent vapor annealing (SVA) of block copolymer thin films.  This �stylus-based� raster-SVA (RSVA) writing method allowed us to generate parallel or perpendicular nanostructures at a given point approximately 2 orders of magnitude faster than conventional �bell jar� solvent vapor annealing.

Free and substrate surface manipulations to locally control nanostructures in block copolymer thin films

245th National Meeting (2013)

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