We have developed a method for creating organosilane nanostructures on indium tin oxide (ITO) using particle lithography and immersion. Glass substrates with ITO films of different thickness and corresponding resistivity were coated with mesospheres and immersed into silane solutions. Silica mesospheres provide a surface mask to prepare periodic arrangements of billions of regular nanostructures with relatively few defects. These spaces can then be further modified to create islands of desired chemical functionalities such as with a second silane using steps of surface-initiated polymerization. The masks were removed by solvent rinsing with sonication and then immersed into a second silane to create the nanoislands within the matrix.  Samples were analyzed using contact and tapping-mode atomic force microscopy to evaluate the height, arrangement and geometries of the nanostructures. The nanostructures provide a foundation for chemical patterning or for molecular-level studies of the conductive or photophysical properties of samples.

Nanostructured films of octadecyltrimethoxysilane prepared on indium tin oxide substrates using particle lithography: Control of surface coverage and density

245th National Meeting (2013)

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