Ultra dense perfectly ordered structures with nanometric periodicity are of crucial importance for applications such as microelectronics or data storage media. Herein we demonstrate the use of a polymeric guiding pattern to control the self-assembly of block copolymers into highly-ordered 2D arrays. For this, a sinusoidal surface-relief grating was interferometrically inscribed onto an azobenzene containing copolymer sub-layer (1). A poly(styrene-b-ethylene oxide), PS-b-PEO, film was cast on top, resulting in cylinders with a 6-fold coordination. When film thickness reaches a critical value where the PS-b-PEO free-surface is smooth and no hint of the underlying sinusoidal pattern is apparent, a defect-free 2D-array of PS-b-PEO cylinders is observed over a large surface. Our results show that the surface deformation induced by the topological pattern controls the diffusion of defects and consequently their annihilation. Figure 1. <img src='https://acs-archive-assets2.s3.amazonaws.com/239nm/uploads/9491_bock-sf.jpg' alt='' /> 1) K. Aisou et al. Adv. Mater. 2013 , 25, 213�217

Directed self assembling of block copolymers and their applications to ultra high density magnetic storage and maskless nano lithography

246th National Meeting (2013)

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