The poster will discuss our results on materials chemistry by two laser chemical deposition methods - CPCD (Confined Plume Chemical Deposition) and LCVD (Laser Chemical Vapor Deposition). Comparison will be made between the two approaches including advantages and disadvantages of each of the two methods. The lasers used include Mid IR tunable picosecond Free Electron Laser, 800 nm Ti:sapphire femtosecond laser, 532 nm SHG of Nd:YAG nanosecond laser, 510/578 nm nanosecond CuBr vapor laser and 2.94 �m Er:YAG microsecond laser. The deposited materials include polycrystalline ReB2, RuB2, WB4, B4C, and Ge on variety of inorganic (Si, Glass, NaCl and Cu), polymer (HDPE, UHMWPE and PTFE) biological (bone and onion) substrates. To the best of our knowledge's this is the only way high temperature crystalline borides can be directly deposited on polymer and biological substrates without visibly destroying underlying surface. Possible mechanism behind CPCD will be discussed. Proposal for building of new kind of pulse laser phase diagram for any material which include not only average power of the laser (or average energy density) but also wavelength, energy per pulse, pulse duration and repetition rate will be considered. Future directions of research for CPCD and LCVD will be presented.

Materials chemistry by pulse visible and IR lasers: CPCD (confined plume chemical deposition) and LCVD (laser chemical vapor deposition)

246th National Meeting (2013)

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