Block copolymers (BCPs) can self-assemble into periodic nanoscale structures, which makes them attractive for next-generation lithography applications. The patterns obtained from BCP assembly must be transferred into a functional substrate using the BCP as an etch mask. Key to transferring the pattern is selective removal of one of the BCP domains, which is traditionally accomplished using reactive ion etching. However, significant drawbacks of this approach, such poor etch contrast between the BCP domains, can significantly impact the quality of transferred pattern. To avoid this problem, a BCP was designed to contain a self-immolating block. Poly(styrene-block-phthalaldehyde) was synthesized and thin films were prepared from a formulation including a photoacid generator. Self-assembly followed by activation of the photoacid generator results in complete depolymerization of the poly(phthalaldehyde) moiety.

Synthesis of poly(phthalaldehyde)-containing block copolymers for lithographic applications

247th National Meeting (2014)

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