Particle lithography offers a versatile approach to generate well-defined surface platforms of organosilanes, organothiols, nanoparticles or proteins. With particle lithography, billions of nanostructured test elements can be prepared with high throughput, with relatively few defects.  Procedures for particle lithography are based on the natural and spontaneous processes of self-assembly to define the arrangement of latex or silica mesospheres to produce a surface mask.  When the mesosphere masks are removed by a rinsing step, the area of contact between the spheres and the surface defines discrete locations for further reactions. Exposed sites of the substrate provide nanoscale containers for confining surface reactions to defined areas to construct supramolecular assemblies. For nanopatterns of self-assembled monolayers, the interfacial endgroups can be designed to spatially define the surface selectivity for adsorption of proteins, nanoparticles or electrolessly deposited metals. An emerging challenge is to investigate physical changes for surfaces or materials in response to environmental parameters at the nanoscale. Multilayer nanostructures of octadecyltrichlorosiloxane provided a test platform for scanning probe studies of solvent-responsive properties where the sides of designed ring structures expose a 3D interface for studying the interaction of solvents with molecular side-groups. Nanostructures change significantly in size and shape when imaged in certain liquid media or with heated conditions.  Approaches for nanoscale lithography will be described for preparing molecular test platforms suitable for scanning probe studies of surface reactions.

Spatially-confined chemical reactions: Application of particle lithography for studies of surface self-assembly

247th National Meeting (2014)

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