In this contribution, a versatile and easy method for the preparation of photolithographically structured cellulose thin films is presented. This method is based on the photoinduced conversion of trimethylsilyl cellulose to cellulose yielding patterned structures in the sub-micron range. Either positive as well as negative type resists can be created, which are employed in the design of gate dielectrics in organic thin film transistors.

Photolithographically structured cellulose materials for microelectronics

247th National Meeting (2014)

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