Hierarchical assembly of diblock copolymer micelles was successfully crafted into parallel stripes by flow enabled self-assembly (FESA).  The micelles were precisely and programmably patterned at desired positions on a silicon substrate. Remarkably, a minimum spacing between two adjacent stripes was observed and a model was, for the first time, proposed to understand the relationship between the width of stripe and the minimum spacing between two adjacent stripes. Moreover, arrays and networks of inorganic nanoparticle were also produced by FESA of diblock copolymer/precursor solution, followed by selective removal of the diblock copolymer template. Such flow enabled self-assembly of diblock copolymer micelles is facile to implement, offering opportunities to create hierarchical structures and materials for potential applications in nanoelectronics.

Programmable crafting of PS-b-P4VP micelles via flow enabled self-assembly

247th National Meeting (2014)

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