We have used polymer pen lithography (PPL) and beam pen lithography (BPL), two recently developed tip-based printing methods, to create microarrays of grafted-from brush polymers. Using the unique ability of the elastomeric tips to apply a force, the first method to covalently pattern graphene by a Diels-Alder oligomerization was shown.[1] These force accelerated cycloadditions are a feasible route to locally alter the chemical and electronic compositon of graphene defect and edge sites under ambient temperature and atmosphere over large (>1 cm2) areas. Alternatively BPL arrays were used to pattern acrylate and methacrylate monomers onto thiol-terminated glass slides. Subsequent exposure to UV light produced brush polymers whose length is controlled precisely by irradiation time, resulting in a 3D lithography method with sub-micrometer control over feature position, feature diameter, and feature height. Thus, PPL and BPL are powerful tools for studying photochemical and force-induced brush polymerizations, and the application of the resulting materials to sensing and electronics will be discussed.[1] Bian, S.; Scott, A.M.; Cao, Y.; Liang, Y.; Osuna, S.; Houk, K.N.; Braunschweig, A.B. J. Am. Chem. Soc. 2013 , 9240-9243.

Photochemically- and force-initiated brush polymer microarrays and their applications in sensing and electronic materials

247th National Meeting (2014)

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