This talk will describe the layer-by-layer (LbL) self-assembly of wavelength-selective photoresponsive polyelectrolyte multilayers (PEMs) that become soluble upon irradiation with visible or ultraviolet light. Random copolymerization of 2-(dimethylamino)ethyl methacrylate with a nitrobenzyl (NB) or coumarin-containing methacrylate monomer yields photoreactive polycations for layer formation by attractive electrostatic interactions with poly(styrene sulfonate). Irradiation with the appropriate wavelength of light cleaves the photoresponsive group from the polymer backbone resulting in reduced electrostatic attraction between the layers causing their dissolution in aqueous base. This photochemical control of the dissolution of PEMs allows for wavelength-selective patterning of surfaces (as shown in Figure 1) and selective release of guest molecules. 

Wavelength selective disruption of photoresponsive polyelectrolyte multilayers

247th National Meeting (2014)

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