In this presentation, two different enigineering approaches to employ molecules for ALD applications will be discussed. One is modification of substrates using molecules (e.g. self-assembled monolayers) to prevent (or enhance) nucleation of ALD (Atomic layer deposition). Self-assembled monolayers (SAMs), as an important sub-group of organic molecules, such as octadecyltrichlorosilane (OTS) etc., are frequently considered as ultrathin materials suitable for surface engineering with nano-scale dimensions. We have demonstrated selective-area deposition using electron-beam patterned SAMs as a nucleation inhibition layer followed by atomic layer deposition (ALD). Nano-line patterns with sub-30 nm resolution and 100 nm in pitch were achieved.The other approach is direct implements of a small molecule as a molecule precursor to deposit self-limiting organic layers which eventually allows layer-by-layer deposition like ALD. A certain linker, such as OTS, Hydroquinone (HQ), was applied to construct multilayers of the organic molecules. Conventional inorganic ALD films can be embedded between the organic layers to form organic-inorganic hybrid nano-laminates. It was found that the thin film characteristics can be varied from insulating and semi-conducting layers as altering the organic component from alkane to aromatic based molecules. This methodology would provide a new route to build 2D nanosheets with unique properties.

Molecule engineering for ALD applications

247th National Meeting (2014)

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