Robust methods for the chemically selective deposition of semiconductors are developed and applied in the construction of complex two- and three-dimensional structures. These methods are easily parallelized, afford precise nanoscale placement and are compatible with photolithography. This work has important applications including in photovoltaics, molecular and organic electronics, and other technologies. Several recent developments in our laboratories are discussed including the chemical bath deposition (CBD) and atomic layer deposition (ALD) of ZnO and the formation of Cu and CuxS �wires� on micron-scale patterned surfaces. We demonstrate that the deposition selectivity and film morphology can be controlled by the deposition technique, the experimental conditions and the underlying substrate chemistry. Optimization and further development of these techniques requires a detailed understanding of the reaction pathways involved in the interaction of organic thin films with organometallic compounds, ions, and other compounds.

Toward organic electronics: Methods for the selective deposition of semiconductors

247th National Meeting (2014)

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